Atmospheric Plasma Characterization and Mechanisms of Substrate Surface Modification
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Date
2007-03-08
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Abstract
The purpose of this research has been to characterize the parameters of an Atmospheric Plasma Device used for surface modifications and functionalization of textile materials. Device parameters are determined in absence and presence of a substrate to quantify the optimal operational conditions. Neutral gas temperature profiles were determined for a variety of gas mixtures including 100% helium and helium with 1 or 2% reactive gases, such as oxygen and carbontetrafluoride. A plasma model was developed to solve for other plasma parameters including the electron-neutral collision frequency and the electron number density. Wool substrates were treated with various gas mixtures for a range of exposure durations and the effects of plasma treatment on weight, surface-functionality, and strength were assessed. Assessment methods include percent weight change calculations, energy dispersive X-ray spectroscopy (EDS), and tensile testing. In addition, cellulosic paper was exposed to 1% oxygen plasma to determine the feasibility of permanently grafting the anti-microbial agent HTCC (quaternized ammonium chitosan). The success of the bond was tested using Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), colorimetry, and percent weight change, and the permanency of the bond was tested though soxhlet extraction.
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Keywords
HTCC, plasma, substrate, wool, cellulosic paper
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Degree
MS
Discipline
Nuclear Engineering
