Experimental and Computational Studies of Carbon Sputtering with Application to Deposition of Tetrahedrally Bonded Amorphous Carbon Films
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Date
2001-08-07
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Abstract
In this work, amorphous carbon films are deposited on various substrates by ion beam sputtering of a graphite target. In addition, computational studies of the carbon sputtering process are performed using a molecular dynamics simulation program. In both cases, several process parameters are varied with the intent to find the optimum conditions for the sputter deposition of amorphous carbon films of high sp content amorphous carbon films.
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PhD
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Materials Science and Engineering
