Characteristics of Replacement Lithography and Desorption on Various Metal Substrates

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Title: Characteristics of Replacement Lithography and Desorption on Various Metal Substrates
Author: Williams, James Alfred
Advisors: Dr. Stefan Franzen, Committee Member
Dr. Edmond F. Bowden, Committee Member
Dr. Christopher B. Gorman, Committee Chair
Abstract: The development of molecular electronic systems relies on the investigation of metal/molecule interactions. A popular methodology to forming metal/molecule interfaces uses the formation of self-assembled monolayers (SAMs), SAMs are capable of forming consistent, well order single to multiple layers of molecules oriented with respect to surface characteristics. While a plethora of techniques exist for exploring this phenomenon the utilization of replacement lithography presents a systematic approach to investigating the formation and stability of SAMs on various substrates. However, in authenticating investigations using lithographic techniques, the employment of electrochemistry forms conclusions on desorption and adsorption characteristics of the SAMs. While contemplating the contribution posed by metal/molecule interactions the facilitation of comparative methodologies in rationalizing processes of altering the characteristics of the monolayers, provides a speculative vantage of future endeavors into the development of molecular electronics.
Date: 2004-07-06
Degree: MS
Discipline: Chemistry
URI: http://www.lib.ncsu.edu/resolver/1840.16/425


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