Electron Beam Induced Chemistry
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Date
2007-08-01
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Abstract
The purpose of this research has been to investigate the mechanisms and develop techniques for electron beam induced chemistry. Applications for electron beam chemistry include repair and fabrication of lithographic masks, integrated circuit repair and rewiring, nanofabrication of functional nanoscale tools and scanned probe microscopy tips and damage free transmission electron microscope sample preparation. The use of hydrocarbon contamination as a precursor has been investigated and complex three dimensional nanostructures have been successfully fabricated. Accelerating voltage and scan speed can be used to control the morphology of the deposits. The development and implementation of an internal precursor reservoir and introduction device that is transferable to various scanning electron microscope and focused ion beam instruments has been performed. The effects of beam and scan parameters on the deposition efficiency of carbon structures utilizing a phenanthrene precursor has been investigated. Deposition efficiency is maximized for low beam current, large scan areas exposed for short times using the experimental conditions in this work. However, the use of a focused ion beam provides a significantly higher deposition efficiency (over 45 times) than that of an electron beam.
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Keywords
chemical vapor deposition, nanofabrication, electron beam induced deposition, Electron Beam Induced Chemistry
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Degree
MS
Discipline
Materials Science and Engineering
