Magnetic Focusing of Ion Beams and Deposition of Hydroxyapatite Films With Graded Crystallinity
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Date
2006-07-27
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Abstract
The purpose of the first part of this work has been to use an electromagnet to improve the performance of the Kaufman ion source. A solenoid was fabricated and placed around the substrate platform in a vacuum chamber equipped with a 3cm Kaufman ion source. The source was run under set conditions and the solenoid current was varied. Langmuir probe and Faraday cup measurements were taken under various solenoid currents. SRIM calculations were done to predict the effect of focusing the ion beam on etching performance.
The purpose of the second part of this work has been to deposit hydroxyapatite films with graded crystallinity. An ion beam assisted deposition system was used to sputter hydroxyapatie films onto silicon samples. The temperature of the samples was lowered during the deposition in order to obtain samples with graded crystallinity. The samples were analyzed using X-ray diffraction and transmission electron microscopy to verify their crystal structure. The samples had a graded crystal structure with nanocrystalline hydroxyapatite with an orientation of (113) transitioning into amorphous hydroxyapatite.
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ion beams hydroxyapatite
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Degree
MS
Discipline
Materials Science and Engineering
