Homoepitaxial growth of alpha-SiC thin films and semiconductor devices fabricated thereon
Title: | Homoepitaxial growth of alpha-SiC thin films and semiconductor devices fabricated thereon |
Date: | 1990 |
Citation: | Kong, H. S., Glass, J. T., & Davis, R. F. (1990). Homoepitaxial growth of alpha-SiC thin films and semiconductor devices fabricated thereon. U.S. Patent No. 4,912,064. Washington, DC: U.S. Patent and Trademark Office. |
URI: | http://www.lib.ncsu.edu/resolver/1840.2/1156 |
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