Deposition of germanium thin films on silicon dioxide employing interposed polysilicon laye

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1993

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Ozturk, M., & Wortman, J. (1993). Deposition of germanium thin films on silicon dioxide employing interposed polysilicon laye. U.S. Patent No. 5,250,452. Washington, DC: U.S. Patent and Trademark Office.

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http://www.lib.ncsu.edu/resolver/1840.2/1230

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