Selective deposition of doped silion-germanium alloy on semiconductor substrate

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Title: Selective deposition of doped silion-germanium alloy on semiconductor substrate
Date: 1993
Citation: Ozturk, M., Grider, D., Sanganeria, M., & Ashburn, S. (1993). Selective deposition of doped silion-germanium alloy on semiconductor substrate. U.S. Patent No. 5,242,847. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1231


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