Selective deposition of doped silion-germanium alloy on semiconductor substrate
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1993
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Ozturk, M., Grider, D., Sanganeria, M., & Ashburn, S. (1993). Selective deposition of doped silion-germanium alloy on semiconductor substrate. U.S. Patent No. 5,242,847. Washington, DC: U.S. Patent and Trademark Office.