Three-zone rapid thermal processing system utilizing wafer edge heating means

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Title: Three-zone rapid thermal processing system utilizing wafer edge heating means
Date: 1995
Citation: Hauser, J., Sorrell, F., & Wortman, J. (1995). Three-zone rapid thermal processing system utilizing wafer edge heating means. U.S. Patent No. 5,418,885. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1237


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