Three-zone rapid thermal processing system utilizing wafer edge heating means
| Title: | Three-zone rapid thermal processing system utilizing wafer edge heating means |
| Date: | 1995 |
| Citation: | Hauser, J., Sorrell, F., & Wortman, J. (1995). Three-zone rapid thermal processing system utilizing wafer edge heating means. U.S. Patent No. 5,418,885. Washington, DC: U.S. Patent and Trademark Office. |
| URI: | http://www.lib.ncsu.edu/resolver/1840.2/1237 |
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| US_5418885_A_I.pdf | 87.99Kb |
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