Electrochemical method for defect delineation in silicon-on-insulator wafers

Show full item record

Title: Electrochemical method for defect delineation in silicon-on-insulator wafers
Date: 1991
Citation: Guilinger, T. R., Jones, H. D. T., Kelly, M. J., Medernach, J. W., Stevenson, J. O., & Tsao, S. S. (1991). Electrochemical method for defect delineation in silicon-on-insulator wafers. U.S. Patent No. 5,015,346. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1278


Files in this item

Files Size Format View
US_5015346_A_I.pdf 131.7Kb PDF View/Open

This item appears in the following Collection(s)

Show full item record