Chemical vapor deposition method for depositing a high k dielectric film

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Title: Chemical vapor deposition method for depositing a high k dielectric film
Date: 2005
Citation: Basceri, C. (2005). Chemical vapor deposition method for depositing a high k dielectric film. U.S. Patent No. 6,884,475. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1303


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