Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface

Show full item record

Title: Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface
Date: 2003
Citation: Yang, W. C., Zeman, M., Ade, H., & Nemanich, R. J. (2003). Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface. Physical review letters, 90(13), 136102-1.
URI: http://www.lib.ncsu.edu/resolver/1840.2/133


Files in this item

Files Size Format View
ade_2003_physical_review_letters.pdf 158.1Kb PDF View/Open

This item appears in the following Collection(s)

Show full item record