Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface
Title: | Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface |
Date: | 2003 |
Citation: | Yang, W. C., Zeman, M., Ade, H., & Nemanich, R. J. (2003). Attractive migration and coalescence: A significant process in the coarsening of TiSi2 islands on the Si(111) surface. Physical review letters, 90(13), 136102-1. |
URI: | http://www.lib.ncsu.edu/resolver/1840.2/133 |
Files in this item
Files | Size | Format | View |
---|---|---|---|
ade_2003_physical_review_letters.pdf | 158.1Kb |
View/ |