Process for manufacturing dual work function metal gates in a microelectronics device

No Thumbnail Available

Date

2007

Authors

Advisors

Journal Title

Series/Report No.

Journal ISSN

Volume Title

Publisher

Abstract

Description

Keywords

Citation

Colombo, L., Chambers, J. J., & Visokay, M. R. (2007). Process for manufacturing dual work function metal gates in a microelectronics device. U.S. Patent No. 7,229,873. Washington, DC: U.S. Patent and Trademark Office.

Degree

Discipline

Collections