Process for manufacturing dual work function metal gates in a microelectronics device

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Title: Process for manufacturing dual work function metal gates in a microelectronics device
Date: 2007
Citation: Colombo, L., Chambers, J. J., & Visokay, M. R. (2007). Process for manufacturing dual work function metal gates in a microelectronics device. U.S. Patent No. 7,229,873. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1335


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