Method for determining interface properties of semiconductor materials by photoreflectance

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dc.date.accessioned 2008-10-14T14:30:49Z
dc.date.available 2008-10-14T14:30:49Z
dc.date.issued 1993
dc.identifier.citation Pollack, F. H., Shen, H. E., & Lucovsky, G. (1993). Method for determining interface properties of semiconductor materials by photoreflectance. U.S. Patent No. 5,255,070. Washington, DC: U.S. Patent and Trademark Office.
dc.identifier.uri http://www.lib.ncsu.edu/resolver/1840.2/1365
dc.format.extent 124967 bytes
dc.format.mimetype application/pdf
dc.language.iso en
dc.title Method for determining interface properties of semiconductor materials by photoreflectance
dc.type Patent


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