Chemical vapor deposition method of forming a material over at least two substrates

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Title: Chemical vapor deposition method of forming a material over at least two substrates
Date: 2004
Citation: Derraa, A., Basceri, C., Vasilyeva, I., Campbell, P. H., & Sandhu, G. S. (2004). Chemical vapor deposition method of forming a material over at least two substrates. U.S. Patent No. 6,730,355. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1385


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