Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers

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Title: Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers
Date: 2003
Citation: Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S. (2003). Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers. U.S. Patent No. 6,586,285. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1396


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