Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers
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2003
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Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S. (2003). Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers. U.S. Patent No. 6,586,285. Washington, DC: U.S. Patent and Trademark Office.