Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD

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Title: Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD
Date: 2001
Citation: Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. (2001). Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD. U.S. Patent No. 6,323,554. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1404


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