Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD

No Thumbnail Available

Date

2001

Authors

Advisors

Journal Title

Series/Report No.

Journal ISSN

Volume Title

Publisher

Abstract

Description

Keywords

Citation

Joshi, R. V., Cuomo, J. J., Dalal, H. M., & Hsu, L. L. (2001). Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD. U.S. Patent No. 6,323,554. Washington, DC: U.S. Patent and Trademark Office.

Degree

Discipline

Collections