Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination

Show full item record

Title: Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination
Date: 1995
Citation: Cuomo, J. J., Guarnieri, C. R., & Hopwood, J. A. (1995). Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination. U.S. Patent No. 5,433,812. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1414


Files in this item

Files Size Format View
US_5433812_A_I.pdf 158.5Kb PDF View/Open

This item appears in the following Collection(s)

Show full item record