Method of etching a substantially amorphous TA2O5 comprising layer

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Title: Method of etching a substantially amorphous TA2O5 comprising layer
Date: 2003
Citation: Basceri, C., Derderian, G. J., Visokay, M. R., Drynan, J. M., & Sandhu, G. S. (2003). Method of etching a substantially amorphous TA2O5 comprising layer. U.S. Patent No. 6,511,896. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1427


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