Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor

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Title: Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor
Date: 2002
Citation: Basceri, C. (2002). Chemical vapor deposition methods of forming a high K dielectric layer and methods of forming a capacitor. U.S. Patent No. 6,335,049. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1435


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