Method for reducing physisorption during atomic layer deposition

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Title: Method for reducing physisorption during atomic layer deposition
Date: 2004
Citation: Gealy, F. D., & Basceri, C. (2004). Method for reducing physisorption during atomic layer deposition. U.S. Patent No. 6,784,083. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1708


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