Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer
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2006
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Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S. (2006). Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer. U.S. Patent No. 7,033,642. Washington, DC: U.S. Patent and Trademark Office.