Atomic layer deposition method

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Title: Atomic layer deposition method
Date: 2006
Citation: Castovillo, P. J., Basceri, C., Derderian, G. J., & Sandhu, G. S. (2006). Atomic layer deposition method. U.S. Patent No. 7,128,787. Washington, DC: U.S. Patent and Trademark Office.

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