Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications
Title: | Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications |
Date: | 2008 |
Citation: | Bocian, D. F., Kuhr, W. G., Lindsey, J. S., Dabke, R. B., & Liu, Z. (2008). Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications. U.S. Patent No. 7,348,206. Washington, DC: U.S. Patent and Trademark Office. |
URI: | http://www.lib.ncsu.edu/resolver/1840.2/1817 |
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