Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications

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Title: Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications
Date: 2008
Citation: Bocian, D. F., Kuhr, W. G., Lindsey, J. S., Dabke, R. B., & Liu, Z. (2008). Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications. U.S. Patent No. 7,348,206. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1817


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