Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
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1996
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Bachmann, K. J., Dietz, N., & Miller, A. E. (1996). Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy. U.S. Patent No. 5552327. Washington, DC: U.S. Patent and Trademark Office.
