Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy

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Title: Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
Date: 1996
Citation: Bachmann, K. J., Dietz, N., & Miller, A. E. (1996). Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy. U.S. Patent No. 5552327. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1876


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