Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
| Title: | Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy |
| Date: | 1996 |
| Citation: | Bachmann, K. J., Dietz, N., & Miller, A. E. (1996). Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy. U.S. Patent No. 5552327. Washington, DC: U.S. Patent and Trademark Office. |
| URI: | http://www.lib.ncsu.edu/resolver/1840.2/1876 |
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