Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
| dc.date.accessioned | 2008-10-24T17:21:32Z | |
| dc.date.available | 2008-10-24T17:21:32Z | |
| dc.date.issued | 1996 | |
| dc.identifier.citation | Bachmann, K. J., Dietz, N., & Miller, A. E. (1996). Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy. U.S. Patent No. 5552327. Washington, DC: U.S. Patent and Trademark Office. | |
| dc.identifier.uri | http://www.lib.ncsu.edu/resolver/1840.2/1876 | |
| dc.format.extent | 323365 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | en | |
| dc.title | Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy | |
| dc.type | Patent |
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| Files | Size | Format | View |
|---|---|---|---|
| Methods_for_monitoring_and_controlling_d.pdf | 315.7Kb |
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