Method of fabricating epitaxially deposited ohmic contacts using group II-V I

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Title: Method of fabricating epitaxially deposited ohmic contacts using group II-V I
Date: 1994
Citation: Schetzina, J. F. (1994). Method of fabricating epitaxially deposited ohmic contacts using group II-V I. U.S. Patent No. 5366927. Washington, DC: U.S. Patent and Trademark Office.
URI: http://www.lib.ncsu.edu/resolver/1840.2/1923


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