Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures

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Title: Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures
Date: 2003
Citation: Ulrich, M. D., Hong, J. G., Rowe, J. E., Lucovsky, G., Chan, A. S. Y., Madey, T. E. (2003). Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 21(4), 1777-1782.
URI: http://www.lib.ncsu.edu/resolver/1840.2/228


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