Electron trapping in noncrystalline remote plasma deposited Hf- aluminate alloys for gate dielectric applications

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Title: Electron trapping in noncrystalline remote plasma deposited Hf- aluminate alloys for gate dielectric applications
Date: 2002
Citation: Johnson, R. S., Hong, J. G., Hinkle, C., & Lucovsky, G. (2002). Electron trapping in noncrystalline remote plasma deposited Hf- aluminate alloys for gate dielectric applications. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 20(3), 1126-1131.
URI: http://www.lib.ncsu.edu/resolver/1840.2/230


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