Bonding constraint-induced defect formation at Si-dielectric interfaces and internal interfaces in dual-layer gate dielectrics
Title: | Bonding constraint-induced defect formation at Si-dielectric interfaces and internal interfaces in dual-layer gate dielectrics |
Date: | 1999 |
Citation: | Lucovsky, G., Wu, Y., Niimi, H., Misra, V., & Phillips, J. C. (1999). Bonding constraint-induced defect formation at Si-dielectric interfaces and internal interfaces in dual-layer gate dielectrics. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 17(4), 1806-1812. |
URI: | http://www.lib.ncsu.edu/resolver/1840.2/241 |
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