Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films

No Thumbnail Available

Date

2002

Authors

Advisors

Journal Title

Series/Report No.

Journal ISSN

Volume Title

Publisher

Abstract

Description

Keywords

Citation

Khandelwal, A., Niimi, H., Lucovsky, G., & Lamb, H. H. (2002). Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 20(6), 1989-1996.

Degree

Discipline

Collections