Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films
No Thumbnail Available
Date
2002
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Khandelwal, A., Niimi, H., Lucovsky, G., & Lamb, H. H. (2002). Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 20(6), 1989-1996.