Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films

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Title: Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films
Date: 2002
Citation: Khandelwal, A., Niimi, H., Lucovsky, G., & Lamb, H. H. (2002). Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 20(6), 1989-1996.
URI: http://www.lib.ncsu.edu/resolver/1840.2/256


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