Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films

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dc.date.accessioned 2008-02-22T23:21:47Z
dc.date.available 2008-02-22T23:21:47Z
dc.date.issued 2002
dc.identifier.citation Khandelwal, A., Niimi, H., Lucovsky, G., & Lamb, H. H. (2002). Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 20(6), 1989-1996.
dc.identifier.uri http://www.lib.ncsu.edu/resolver/1840.2/256
dc.format.extent 131462 bytes
dc.format.mimetype application/pdf
dc.language.iso en
dc.title Low-temperature Ar/N-2 remote plasma nitridation of SiO2 thin films
dc.type Article


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