Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride

Show full item record

Title: Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride
Date: 2001
Citation: Boehme, C., & Lucovsky, G. (2001). Dissociation reactions of hydrogen in remote plasma-enhanced chemical-vapor-deposition silicon nitride. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 19(5), 2622-2628.
URI: http://www.lib.ncsu.edu/resolver/1840.2/257


Files in this item

Files Size Format View
lucovsky_2001_journal_vacuum_science_tech_2622.pdf 116.8Kb PDF View/Open

This item appears in the following Collection(s)

Show full item record