Plasma-assisted formation of low defect density SiC-SiO2 interfaces

Show full item record

Title:	Plasma-assisted formation of low defect density SiC-SiO2 interfaces
Date:	1997
Citation:	Golz, A., Lucovsky, G., Koh, K., Wolfe, D., Niimi, H., & Kurz, H. (1997). Plasma-assisted formation of low defect density SiC-SiO2 interfaces. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 15(4), 1097-1104.
URI:	http://www.lib.ncsu.edu/resolver/1840.2/259



Files in this item

Files	Size	Format	View
Lucovsky_1997_Journal_Vac_Sci_Tech_B_1097.pdf	154.5Kb	PDF	View/Open

This item appears in the following Collection(s)

• Publications
  

Show full item record