Plasma-assisted formation of low defect density SiC-SiO2 interfaces

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dc.date.accessioned 2008-02-22T23:25:34Z
dc.date.available 2008-02-22T23:25:34Z
dc.date.issued 1997
dc.identifier.citation Golz, A., Lucovsky, G., Koh, K., Wolfe, D., Niimi, H., & Kurz, H. (1997). Plasma-assisted formation of low defect density SiC-SiO2 interfaces. Journal of vacuum science & technology. B, Microelectronics and nanometer structures, 15(4), 1097-1104.
dc.identifier.uri http://www.lib.ncsu.edu/resolver/1840.2/259
dc.format.extent 158276 bytes
dc.format.mimetype application/pdf
dc.language.iso en
dc.title Plasma-assisted formation of low defect density SiC-SiO2 interfaces
dc.type Article


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