Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy

Show full item record

Title: Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy
Date: 1999
Citation: Keister, J. W., Rowe, J. E., Kolodziej, J. J., Niimi, H., Tao, H. S., Madey, T. E., & Lucovsky, G. (1999). Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 17(4), 1250-1257.
URI: http://www.lib.ncsu.edu/resolver/1840.2/274


Files in this item

Files Size Format View
lucovsky_1999_journal_vacuum_science_tech_1250.pdf 155.3Kb PDF View/Open

This item appears in the following Collection(s)

Show full item record