Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy

No Thumbnail Available

Date

1999

Authors

Advisors

Journal Title

Series/Report No.

Journal ISSN

Volume Title

Publisher

Abstract

Description

Keywords

Citation

Keister, J. W., Rowe, J. E., Kolodziej, J. J., Niimi, H., Tao, H. S., Madey, T. E., & Lucovsky, G. (1999). Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 17(4), 1250-1257.

Degree

Discipline

Collections