Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy
No Thumbnail Available
Date
1999
Authors
Advisors
Journal Title
Series/Report No.
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Citation
Keister, J. W., Rowe, J. E., Kolodziej, J. J., Niimi, H., Tao, H. S., Madey, T. E., & Lucovsky, G. (1999). Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 17(4), 1250-1257.