Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon
| Title: | Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon |
| Date: | 1998 |
| Citation: | Schafer, J., Young, A. P., Brillson, L. J., Niimi, H., & Lucovsky, G. (1998). Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon. Applied physics letters, 73(6), 791-793. |
| URI: | http://www.lib.ncsu.edu/resolver/1840.2/276 |
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| Lucovsky_1998_ApplPhysLetter_791.pdf | 78.40Kb |
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