Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon

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Title: Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon
Date: 1998
Citation: Schafer, J., Young, A. P., Brillson, L. J., Niimi, H., & Lucovsky, G. (1998). Depth-dependent spectroscopic defect characterization of the interface between plasma-deposited SiO2 and silicon. Applied physics letters, 73(6), 791-793.
URI: http://www.lib.ncsu.edu/resolver/1840.2/276


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