Low-temperature (<450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997)
| Title: | Low-temperature (<450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997) |
| Date: | 1998 |
| Citation: | Wolfe, D. M., Wang, F., Habermehl, S., Lucovsky, G. (1998). Low-temperature (<450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997) Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 16(1), 207. |
| URI: | http://www.lib.ncsu.edu/resolver/1840.2/282 |
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