Monolayer incorporation of nitrogen at Si-SiO2 interfaces: Interface characterization and electrical properties

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Title: Monolayer incorporation of nitrogen at Si-SiO2 interfaces: Interface characterization and electrical properties
Date: 1998
Citation: Lucovsky, G. (1998). Monolayer incorporation of nitrogen at Si-SiO2 interfaces: Interface characterization and electrical properties. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 16(1), 356-364.
URI: http://www.lib.ncsu.edu/resolver/1840.2/284


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