Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing

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Title: Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing
Date: 1998
Citation: Lucovsky, G., Niimi, H., Wu, Y., Parker, C. R., & Hauser, J. R. (1998). Optimization of nitrided gate dielectrics by plasma-assisted and rapid thermal processing. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 16(3 pt.2), 1721-1729.
URI: http://www.lib.ncsu.edu/resolver/1840.2/285


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