Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements

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Title: Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements
Date: 1998
Citation: Yang, H., & Lucovsky, G. (1998). Stability of Si-O-F low-K dielectrics: Attack by water molecules as function of near-neighbor Si-F bonding arrangements. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 16(3 (part 2)), 1525-1528.
URI: http://www.lib.ncsu.edu/resolver/1840.2/286


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