Fluorine atom induced decreases to the contribution of infrared vibrations to the static dielectric constant of Si-O-F alloy films

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Title: Fluorine atom induced decreases to the contribution of infrared vibrations to the static dielectric constant of Si-O-F alloy films
Date: 1997
Citation: Lucovsky, G., & Yang, H. (1997). Fluorine atom induced decreases to the contribution of infrared vibrations to the static dielectric constant of Si-O-F alloy films. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 15(3 pt.1), 836-843.
URI: http://www.lib.ncsu.edu/resolver/1840.2/287


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