Low-temperature (less than 450 degrees), plasma-assisted deposition of poly-si thin films on SiO(2) and glass through interface engineering
| Title: | Low-temperature (less than 450 degrees), plasma-assisted deposition of poly-si thin films on SiO(2) and glass through interface engineering |
| Date: | 1997 |
| Citation: | Wolfe, D. M., Wang, F., Lucovsky, Gerald. (1997). Low-temperature (less than 450 degrees), plasma-assisted deposition of poly-si thin films on SiO(2) and glass through interface engineering. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 15(3 pt. 1), 1035-1040. |
| URI: | http://www.lib.ncsu.edu/resolver/1840.2/288 |
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