Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition

Show full item record

Title: Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition
Date: 1986
Citation: Pai, P. G., Chao, S. S., Takagi, Y., & Lucovsky, G. (1986). Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 4(3), 689-694.
URI: http://www.lib.ncsu.edu/resolver/1840.2/290


Files in this item

Files Size Format View
lucovsky_1986_j ... uum_science_tech_A_689.pdf 960.1Kb PDF View/Open

This item appears in the following Collection(s)

Show full item record