Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition
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1986
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Pai, P. G., Chao, S. S., Takagi, Y., & Lucovsky, G. (1986). Infrared spectroscopic study of siox films produced by plasma enhanced chemical vapor-deposition. Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 4(3), 689-694.
