Reaction pathways in remote plasma nitridation of ultrathin SiO2 films

Show full item record

Title:	Reaction pathways in remote plasma nitridation of ultrathin SiO2 films
Date:	2001
Citation:	Niimi, H., Khandelwal, A., Lamb, H. H., & Lucovsky, G. (2001). Reaction pathways in remote plasma nitridation of ultrathin SiO2 films. Journal of applied physics, 91(1), 48-55.
URI:	http://www.lib.ncsu.edu/resolver/1840.2/417



Files in this item

Files	Size	Format	View
lucovsky_2002_j_appl_phys_48.pdf	147.8Kb	PDF	View/Open

This item appears in the following Collection(s)

• Publications
  

Show full item record