Reaction pathways in remote plasma nitridation of ultrathin SiO2 films

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Title:	Reaction pathways in remote plasma nitridation of ultrathin SiO2 films
Date:	2001
Citation:	Niimi, H., Khandelwal, A., Lamb, H. H., & Lucovsky, G. (2001). Reaction pathways in remote plasma nitridation of ultrathin SiO2 films. Journal of applied physics, 91(1), 48-55.
URI:	http://www.lib.ncsu.edu/resolver/1840.2/417



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