Reaction pathways in remote plasma nitridation of ultrathin SiO2 films
Title: | Reaction pathways in remote plasma nitridation of ultrathin SiO2 films |
Date: | 2001 |
Citation: | Niimi, H., Khandelwal, A., Lamb, H. H., & Lucovsky, G. (2001). Reaction pathways in remote plasma nitridation of ultrathin SiO2 films. Journal of applied physics, 91(1), 48-55. |
URI: | http://www.lib.ncsu.edu/resolver/1840.2/417 |
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