Reaction pathways in remote plasma nitridation of ultrathin SiO2 films

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dc.date.accessioned 2008-03-03T20:49:47Z
dc.date.available 2008-03-03T20:49:47Z
dc.date.issued 2001
dc.identifier.citation Niimi, H., Khandelwal, A., Lamb, H. H., & Lucovsky, G. (2001). Reaction pathways in remote plasma nitridation of ultrathin SiO2 films. Journal of applied physics, 91(1), 48-55.
dc.identifier.uri http://www.lib.ncsu.edu/resolver/1840.2/417
dc.format.extent 151449 bytes
dc.format.mimetype application/pdf
dc.language.iso en
dc.title Reaction pathways in remote plasma nitridation of ultrathin SiO2 films
dc.type Article


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