Coupled electron-hole dynamics at the Si/SiO2 interface

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dc.date.accessioned 2008-03-04T01:57:23Z
dc.date.available 2008-03-04T01:57:23Z
dc.date.issued 1998
dc.identifier.citation Wang, W., Lupke, G., Di Ventra, M., Pantelides, S. T., Gilligan, J. M., Tolk, N. H., Kizilyalli, I. C., Roy, P. K., Margaritondo, G., Lucovsky, G. (1998). Coupled electron-hole dynamics at the Si/SiO2 interface. Physical review letters, 81(19), 4224-4227.
dc.identifier.uri http://www.lib.ncsu.edu/resolver/1840.2/459
dc.format.extent 126226 bytes
dc.format.mimetype application/pdf
dc.language.iso en
dc.title Coupled electron-hole dynamics at the Si/SiO2 interface
dc.type Article


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