Coupled electron-hole dynamics at the Si/SiO2 interface

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dc.date.accessioned	2008-03-04T01:57:23Z
dc.date.available	2008-03-04T01:57:23Z
dc.date.issued	1998
dc.identifier.citation	Wang, W., Lupke, G., Di Ventra, M., Pantelides, S. T., Gilligan, J. M., Tolk, N. H., Kizilyalli, I. C., Roy, P. K., Margaritondo, G., Lucovsky, G. (1998). Coupled electron-hole dynamics at the Si/SiO2 interface. Physical review letters, 81(19), 4224-4227.
dc.identifier.uri	http://www.lib.ncsu.edu/resolver/1840.2/459
dc.format.extent	126226 bytes
dc.format.mimetype	application/pdf
dc.language.iso	en
dc.title	Coupled electron-hole dynamics at the Si/SiO2 interface
dc.type	Article



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